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Inne
Metal-organic framework thin films as platforms for atomic layer deposition of cobalt ions to enable electrocatalytic water oxidation.
Autorzy
Rok wydania
2015
Czasopismo
ACS Applied Materials and Interfaces
Numer woluminu
7
Strony
28223-28230
DOI
10.1021/acsami.5b06901
Kolekcja
Język
Angielski
Typ publikacji
Artykuł
Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.
Słowa kluczowe
metal organic frameworks, water oxidation, electrocatalyst, atomic layer deposition, cobalt oxide, pyrene
Adres publiczny
http://dx.doi.org/10.1021/acsami.5b06901
Strona internetowa wydawcy
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